1. Chemical vapor deposition: principles and application
پدیدآورنده : / edited by Michael L.Hitchman, Klavs F.Jensen
کتابخانه: Central Library, Center of Documentation and Supply of Scientific Resources (East Azarbaijan)
موضوع : Plasma- Enhanced chemical vapor deposition,Vapor deposition
رده :
TS695
.
15
.
C33
1983
2. Dustry plasmas : physics, chemistry and technological impacts in plasma processing
پدیدآورنده : edited by Andre Bouchoule
کتابخانه: Central Library of Amirkabir University of Technology (Tehran)
موضوع : Plasma engineering , Plasma )Ionized gases( , Dusty Plasmas , Plasma chemistry , Plasma-enhanced chemical vapor deposition
رده :
TA
2020
.
D88
1999
3. Dusty plasmas: physics, chemistry, and technological impacts in plasma processing
پدیدآورنده : edited by Andre Bouchoule
کتابخانه: Library and Documentation Center of Kurdistan University (Kurdistan)
موضوع : ، Plasma engineering,، Plasma )Ionized gases- Industrial applications,، Dusty plasmas,، Plasma chemistry,، Plasma-enhanced chemical vapor deposition
رده :
TA
2020
.
D88
1999
4. Plasma Deposition of Amorphous silicon- Based MAterials
پدیدآورنده :
کتابخانه: Central Library and Information Center of the University of Mohaghegh Ardabili (Ardabil)
موضوع : Amorphous Semiconductors - Design and Construction,Silicon alloys,Plasma - Enhanced chemical vapor deposition
رده :
TK7871
.
99
.
A45P55
1995
5. Plasma deposition of amorphous silicon-based materials
پدیدآورنده :
موضوع : ، Amorphous semiconductors-- Design and construction,، Silicon alloys,، Plasma-enhanced chemical vapor deposition
۳ نسخه از این کتاب در ۳ کتابخانه موجود است.
6. Plasma deposition of amorphous silicon-based materials /
پدیدآورنده : edited by Giovanni Bruno, Pio Capezzuto, Arun Madan.
کتابخانه: Center and Library of Islamic Studies in European Languages (Qom)
موضوع : Amorphous semiconductors-- Design and construction.,Plasma-enhanced chemical vapor deposition.,Silicon alloys.,Amorphous semiconductors-- Design and construction.,Plasma-enhanced chemical vapor deposition.,Silicon alloys.,TECHNOLOGY & ENGINEERING-- Electronics-- Semiconductors.,TECHNOLOGY & ENGINEERING-- Electronics-- Solid State.
رده :
TK7871
.
99
.
A45
P55
1995eb
7. Plasma processing of polymers: ]Proceedings of the NATO Advanced Study institute on Plasma Treatments and Deposition of Polymers, Acauafredda di Moratea, Italy, May 19 - June 2, 1996[
پدیدآورنده : edited by Riccardo d Agostino, Pietro Favia and Francesco Fracassi
کتابخانه: Central Library of Amirkabir University of Technology (Tehran)
موضوع : Polymers - Congresses , Plasma polymerization - Congresses , Plasma-enhanced chemical vapor deposition - Congresses
رده :
TP
1092
.
N38
1997
8. Plasma techniques for Film deposition
پدیدآورنده : / Mitsuharu Konuma
کتابخانه: University of Tabriz Library, Documentation and Publication Center (East Azarbaijan)
موضوع : Thin films,Plasma-enhanced chemical vapor deposition
رده :
TK7871
.
15
.
P5
,.
K58
2005
9. Plasma techniques for film deposition
پدیدآورنده : Konuma, Mitsuharu
کتابخانه: Library of College of Science University of Tehran (Tehran)
موضوع : ، Plasma-enhanced chemical vapor deposition,، Thin films
رده :
TK
7871
.
15
.
F5
K58
2005
10. Synthetic diamond
پدیدآورنده :
کتابخانه: Library of Institute For Color Science and Technology (Tehran)
موضوع : Diamond, Artificial,Plasma-Enhanced chemical vapor deposition
رده :
{
1648
},
53e16de071b02df602719ebdaac7d9c4
11. Synthetic diamond :emerging CVD science and technology
پدیدآورنده : edited by Karl E. Spear, John P. Dismukes ; sponsored by the Electrochemical Society, Inc
کتابخانه: Central Library and Documentation Center (Semnan)
موضوع : ، Diamonds, Artificial,، Plasma-enhanced chemical vapor deposition
رده :
TP
873
.
5
.
D5
S96
1994
12. Synthetic diamond : emerging CVD science and technology
پدیدآورنده : edited by Karl E. Spear, John P. Dismukes ; sponsored by the Electrochemical Society, Inc
کتابخانه: Library of Campus2 Colleges of Engineering of Tehran University (Tehran)
موضوع : Diamonds, Artificial,Plasma-enhanced chemical vapor deposition
رده :
TP
873
.
5
.
D5S96
1994
13. Synthetic diamond: emerging CVD science and technology
پدیدآورنده : edited by Karl E. Spear, John P. Dismukes; sponsored by the Electrochemical Society, Inc
کتابخانه: Central Library and Documents Center of Industrial University of Khaje Nasiredin Toosi (Tehran)
موضوع : ، Diamonds, Artificial,، Plasma-enhanced chemical vapor deposition
رده :
TP
873
.
5
.
D5S96
14. Vertically-oriented graphene
پدیدآورنده : / Junhong Chen, Zheng Bo, Ganhua Lu
کتابخانه: Central Library, Center of Documentation and Supply of Scientific Resources (East Azarbaijan)
موضوع : Plasma-enhanced chemical vapor deposition.,Graphene
رده :
TS695
.
15
.
C5
2015
